ASTM E1558-2009 金相试样电解抛光标准指南

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【英文标准名称】:StandardGuideforElectrolyticPolishingofMetallographicSpecimens
【原文标准名称】:金相试样电解抛光标准指南
【标准号】:ASTME1558-2009
【标准状态】:现行
【国别】:美国
【发布日期】:2009
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:E04.01
【标准类型】:(Guide)
【标准水平】:()
【中文主题词】:
【英文主题词】:electrolyticpolishing;electropolishing;polishing;specimenpreparation(metallographic);Alcohol;Alkalineelectrolytes;Chromiumtrioxide;Electrolyticpolishing;Electropolishing;Glacialaceticacid;Metalliccoatings;Metallographicpreparation;
【摘要】:AdvantagesofElectrolyticPolishing:Forsomemetals,ahighqualitysurfacefinishcanbeproducedthatisequivalentto,orbetterthan,thatwhichcanbeobtainedbymechanicalmethods.Onceprocedureshavebeenestablished,satisfactoryresultscanbeobtainedrapidlywithreproducibility.Therecanbeamarkedsavingoftimeifmanyspecimensofthesamematerialarepolishedsequentially.Electropolishingaselectedareaonthesurfaceofarelativelylargemetalpartcanbeaccomplishednondestructively,thatis,withouttheneedforsectioningtoremoveapiece.Soft,single-phasemetals,whichmaybedifficulttopolishbymechanicalmethods,maybesuccessfullyelectropolished.Thetruemicrostructureofaspecimencanbeobtainedbecauseartifacts(suchasdisturbedmetal,scratches,andmechanicaltwins)producedonthesurface,evenbycarefulgrindingandmechanicalpolishingoperations,canberemoved.Thesefeaturesareimportantinlow-loadhardnesstesting,X-raydiffractionstudies,andinelectronmicroscopy,wherehigherresolutionputsapremiumonundistortedmetalsurfaces.Afterelectropolishingiscompleted,etchingcanoftenbeaccomplishedbyreducingthevoltage(generallytoaboutone-tenththatrequiredforpolishing)forashorttimebeforeitisturnedoff.Note28212;Notallelectropolishingsolutionsproducegoodetchingresults.DisadvantagesofElectrolyticPolishing:Manyofthechemicalmixturesusedinelectropolishingarepoisonousordangerousifnotproperlyhandled(seeSection5).Thesehazardsaresimilartothoseinvolvedinthemixingandhandlingofetchants,seeTestMethodsE407.Inmulti-phasealloys,thepolishingrateofeachphasemaybedifferent.Theresultmaybeanon-planarsurface.Electropolishedsurfacesmaybeslightlyundulatedratherthanperfectlyplanarand,therefore,maynotbesuitableforexaminationatallmagnifications.Therateofpolishinginareasadjacenttovariousinhomogeneities,suchasnonmetallicinclusionsandvoids,isusuallygreaterthanthatinthesurroundingmatrixandtendstoexaggeratethesizeoftheinclusionsandvoids.Dimples,pits,andwavinesslimitapplicationsinvolvingsurfacephenomena,coatings,interfaces,andcracks.Edgestendtobeattackedpreferentially,resultinginedgerounding.Artifactsmaybeproducedbyelectropolishing.Specimenmountingmaterialsmayreactwiththeelectrolyte.Theelectropolishedsurfacesofcertainmaterialsmaybepassiveanddifficulttoetch.Metalremovalratesbyelectropolishingareusuallyquitelow,typicallyabout1x03BC;m/min,andallofthepriorinduceddamagefromcuttingandgrindingmaynotberemovedifpreparationisstoppedaftera600-gritSiCgrindandelectropolishingtimesareshort.Alargenumberofelectrolytesmaybeneededtopolishthevarietyofmetalsencounteredbyagivenlaboratory.Considerabletimemayberequiredtodevelopaprocedureforanewalloy.1.1Thisguidedealswithelectrolyticpolishingasameansofpreparationofspecimensformetallographicpurposes.Proceduresaredescribedforpolishingavarietyofmetals.Note18212;References(1-133)onelectrolyticpolishingwillprovidethereaderwithspecificinformationbeyondthescopeofthisguide.1.2ThevaluesstatedinSIunitsaretoberegardedasstandard.Nootherunitsofmeasurementareincludedinthisstandard.1.3Thisstandarddoesn......
【中国标准分类号】:H24
【国际标准分类号】:25_220_20
【页数】:14P.;A4
【正文语种】:英语